• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a plasma display panel that can increase the performance and lifespan of a PDP device by forming a diffusion barrier for alkali ions between a surface glass substrate and an electrode, wherein a barrier rib and an address are formed on a rear glass substrate. Forming the electrodes in a stripe (stripe) shape and then performing a sintering process, applying a phosphor to cover the address electrode inside each cell, and to prevent the movement of alkali ions on the surface glass substrate A second process of sequentially laminating a diffusion barrier film, a display electrode, a dielectric layer, and a dielectric protective layer using magnesium oxide (MgO), followed by firing; and a space between the address electrode and the display electrode The back glass substrate and the surface glass substrate are fused using a sealing glass frit so that they are perpendicular to each other. It characterized by comprising a third write process of assembly. In this case, the diffusion barrier is a CNx (Carbon Nitride) thin film formed by the Cs + ion beam sputtering deposition method is formed with a thickness of 1000 to 2000Å, the nitrogen content is 40 to 50%, the transmittance in visible light is It is characterized by more than 90%.
    公开号:KR19990030734A
    申请号:KR1019970051092
    申请日:1997-10-04
    公开日:1999-05-06
    发明作者:이윤관
    申请人:구자홍；엘지전자 주식회사；
    IPC主号:
    专利说明:

    Manufacturing Method of Plasma Display Panel
    BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a plasma display panel, and more particularly, to a method of manufacturing a plasma display panel in which a diffusion barrier layer is formed so as to improve device performance.
    A general plasma display panel (hereinafter referred to as PDP) is expected to be the next generation display device, and is generated during Xe gas discharge such as neon or helium between two glass substrates facing each other. The vacuum ultraviolet ray of 140 nm excites fluorescent substance, and is a gas discharge display element which uses the luminescence phenomenon by photoluminescence.
    1 is a view showing a manufacturing process of a PDP according to the prior art.
    Referring to FIG. 1, first, stripe ribs 20 are formed on a rear glass plate 10 to maintain a discharge distance and to prevent electrical and optical interference between adjacent cells. After forming in a shape, the red (R), green (G), blue (B) phosphor 30 is applied separately in the cell determined by the partition wall (20). In this case, the phosphor 30 coated in each discharge cell unit is coated to cover the address electrode 40 formed in parallel with the partition wall 20 between the partition walls 20.
    On the other hand, after the display electrode 60 made of a metallic material such as Cu, Ni, Ag, or the like is formed on the front glass plate 50 by the screen printing method, a dielectric layer is used for protecting the electrode and maintaining the discharge. ) 70 and the dielectric protective layer 80 using magnesium oxide (MgO) are sequentially stacked.
    Thereafter, the rear glass substrate 10 and the surface glass substrate 50 made as described above are fused using a sealing glass to complete the production of the PDP. In this case, the address electrode 40 and the display electrode 60 are assembled to be perpendicular to each other.
    In the conventional method of manufacturing a plasma display panel as described above, when screen printing is performed on the surface glass substrate 50 to form an electrode, 500 ° C. to 600 ° C. is used to remove binders in the paste. Since the firing operation is performed at ℃, and the firing operation is performed at 600 ℃ after printing the dielectric layer 70 and the dielectric protective layer 80, the movement of Na + , k 2 + , Ca 2 + in each glass substrate Easy alkali ions increase the non-crosslinked oxygen of the glass substrate, making the glass structure open, causing rapid diffusion of alkali ions.
    In this case, since alkali ions penetrating into the lattice of the electrode are different in size and valence of the small supporter of the electrode material, distortion of the periodicity of the lattice is generated to cause electron scattering, thereby increasing the electrical resistance of the electrode. For this reason, in the prior art, there is a problem that causes an increase in power consumption, a responsiveness, and a decrease in lifespan of the PDP device.
    The present invention has been made to solve the above problems, the object of the present invention is to form a plasma display panel that can increase the performance and life of the PDP device by forming a diffusion barrier for alkali ions between the surface glass substrate and the electrode To provide a method.
    1 is a view showing a PDP manufacturing process according to the prior art,
    2 is a view showing a PDP manufacturing process according to the present invention,
    3 is a view showing an ion beam sputtering apparatus used in the present invention,
    <Description of Symbols for Main Parts of Drawings>
    110: back glass substrate 120: partition wall
    130: phosphor 140: address electrode
    150: surface glass substrate 155: diffusion barrier
    160: display electrode 170: dielectric layer
    180: dielectric protective layer
    According to a first aspect of the present invention for achieving the above object, a barrier rib and an address electrode are formed in a stripe shape on a rear glass substrate and then fired, and an address ( address) a first process of applying a phosphor to cover the electrode,
    A second process of sequentially laminating a diffusion barrier layer, a display electrode, a dielectric layer, and a dielectric protective layer using magnesium oxide (MgO) on the surface glass substrate to prevent the movement of alkali ions;
    Manufacture of a plasma display panel comprising a third process of assembling the rear glass substrate and the surface glass substrate by sealing using a sealing glass frit such that the address electrode and the display electrode are orthogonal to each other with a predetermined space therebetween. Provide a method.
    According to a second aspect of the present invention, the diffusion barrier layer in the second process is a CNx (Carbon Nitride) thin film having a nitrogen content of 40 to 50%, a thickness of 1000 to 2000 GPa, and a transmittance in visible light. Use 90% or more of this.
    In addition, according to the third aspect of the present invention, the diffusion barrier layer in the second process is formed by the Cs + ion beam sputtering deposition method.
    Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail.
    2 is a diagram illustrating a manufacturing process of a plasma display panel according to the present invention.
    Referring to FIG. 2, first, the barrier 120 is formed on the rear glass substrate 110 by a printing method using a glass paste in a stripe shape in the same manner as in the prior art, and then fired at 500 to 600 ° C. The phosphor 130 is coated by a printing method so as to cover the address electrode 140 inside each cell.
    On the other hand, the diffusion barrier layer 155 is formed on the surface glass substrate 150 to a thickness of 1000 to 2000 kW using a Cs + ion beam sputtering deposition method. At this time, the diffusion barrier is CNx (Carbon Nitride) thin film, the nitrogen content is 40 to 50%, the transmittance in the visible light is used 90% or more.
    After the diffusion barrier 155 is formed, a display electrode 160 made of a metal material such as Cu, Ni, Ag, or the like is formed thereon by a screen printing method, and baking is performed at 500 to 600 ° C.
    In addition, the dielectric layer 170 and the dielectric protective layer 180 using magnesium oxide (MgO) are sequentially applied by a printing method and laminated in the same manner as in the conventional case, and then fired at 600 ° C. .
    Thereafter, the rear glass substrate 110 and the surface glass substrate 150 made as described above are fused at 400 to 500 ° C. using a sealing glass frit to complete the production of the PDP. In this case, the address electrode 140 and the display electrode 160 are assembled to be orthogonal to each other with a predetermined space therebetween.
    3 is a view showing the configuration of an ion beam sputtering apparatus used in the present invention.
    The deposition process of the diffusion barrier 155 is described in detail with reference to FIG. 3.
    First, a soda-lime silicate-based glass substrate for PDP of a certain size is ultrasonically cleaned and chemically cleaned, and dried in an oven at 100 ° C. for 3 to 4 hours, and then placed in a reaction chamber of the sputtering apparatus. Load.
    Then, pumping the chamber pressure to 5 * 10 -6 torr and applying a voltage of about 3.5 KV (0.36 mA) to the cesium ion source in the solid state, the emitted Cs + ion beam becomes a graphite target (graphite). C - ions generated by sputtering a target) are accelerated toward the glass substrate by an electric field, and are combined with N + ions supplied from the outside to form a CNx thin film.
    In this case, the current density of the emitted Cs + ion beam is about 100 mA / cm 2.
    The method of manufacturing the plasma display panel of the present invention as described above forms a diffusion barrier for preventing the movement of alkali ions by using the ion beam sputtering deposition method, so that thermal stability can be maintained during the firing operation, thereby extending the life of the PDP device. There is an effect that can increase the performance at the same time.
    权利要求:
    Claims (4)
    [1" claim-type="Currently amended] A first process of forming a barrier rib and an address electrode in a stripe shape on the rear glass substrate and performing firing, and applying a phosphor to cover the address electrode in each cell;
    A second process of sequentially laminating a diffusion barrier layer, a display electrode, a dielectric layer, and a dielectric protective layer using magnesium oxide (MgO) on the surface glass substrate to prevent the movement of alkali ions;
    And a third process of assembling the rear glass substrate and the surface glass substrate by fusion sealing using a sealing glass frit such that the address electrode and the display electrode are orthogonal to each other with a predetermined space therebetween. Method for manufacturing a display panel.
    [2" claim-type="Currently amended] The method of claim 1,
    The diffusion barrier layer in the second process is a CNx (Carbon Nitride) thin film, the nitrogen content is a method of manufacturing a plasma display panel, characterized in that 40 to 50%.
    [3" claim-type="Currently amended] The method of claim 1,
    The diffusion barrier layer in the second process is formed to a thickness of 1000 to 2000Å, the transmittance of visible light is 90% or more manufacturing method of the plasma display panel.
    [4" claim-type="Currently amended] The method of claim 1,
    The diffusion barrier layer in the second process is formed by a Cs + ion beam sputtering deposition method.
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    同族专利:
    公开号 | 公开日
    KR100251159B1|2000-04-15|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    1997-10-04|Application filed by 구자홍, 엘지전자 주식회사
    1997-10-04|Priority to KR1019970051092A
    1999-05-06|Publication of KR19990030734A
    2000-04-15|Application granted
    2000-04-15|Publication of KR100251159B1
    优先权:
    申请号 | 申请日 | 专利标题
    KR1019970051092A|KR100251159B1|1997-10-04|1997-10-04|Manufacturing method of plasma display panel|
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